The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering
dc.contributor.author | DEPLA, Diederik |
dc.contributor.author | LAMAS, Jerika |
dc.contributor.author
hal.structure.identifier | BESNARD, Aurélien
|
dc.date.accessioned | 2016 |
dc.date.available | 2016 |
dc.date.issued | 2016 |
dc.date.submitted | 2016 |
dc.identifier.issn | 0042-207X |
dc.identifier.uri | http://hdl.handle.net/10985/10914 |
dc.description.abstract | Mixed oxide thin films, such as yttria-stabilized zirconia, deposited by dual reactive magnetron sputtering on a non-rotating substrate show a typical microstructure of bended, or tilted columns. Two effects define the tilt. The first effect is the compositional gradient over each column which results in a different lattice spacing. To accommodate this difference, the column bends. As such, the chemical composition has a major influence on the final columnar tilt. The second effect is ballistic shadowing which is controlled by the pressure-distance product. At higher pressure-distances, this second effect plays a more prominent role, and a different behaviour of the columnar tilt as a function of the film composition is noticed. The experimental trends can be understood by the use of a particle trajectory code which provides the angular and energy distribution of the atoms to a ballistic aggregation Monte Carlo code simulating the resulting microstructure. |
dc.language.iso | en |
dc.publisher | Elsevier |
dc.rights | Post-print |
dc.subject | Yttria-stabilized zirconia |
dc.subject | Dual magnetron sputtering |
dc.subject | Modelling |
dc.subject | Monte Carlo |
dc.title | The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering |
ensam.embargo.terms | 2016-12-13 |
dc.typdoc | Article dans une revue avec comité de lecture |
dc.localisation | Centre de Cluny |
dc.subject.hal | Physique: matière Condensée: Science des matériaux |
dc.subject.hal | Sciences de l'ingénieur: Micro et nanotechnologies/Microélectronique |
ensam.audience | Internationale |
ensam.page | 118-122 |
ensam.journal | Vacuum |
ensam.volume | 125 |
ensam.peerReviewing | Oui |
hal.identifier | hal-01333434 |
hal.version | 1 |
hal.status | accept |