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dc.contributor.authorAOUADI, Khalil
dc.contributor.author
 hal.structure.identifier
TLILI, Brahim
300862 Ecole Nationale d'Ingénieurs de Tunis [ENIT]
dc.contributor.author
 hal.structure.identifier
CHAFRA, Moez
302967 Institut préparatoire aux études scientifiques et techniques [La Marsa] [IPEST]
dc.contributor.authorNOUVEAU, Corinne
dc.contributor.author
 hal.structure.identifier
BESNARD, Aurélien
127742 Laboratoire Bourguignon des Matériaux et Procédés [LABOMAP]
dc.date.accessioned2016
dc.date.available2016
dc.date.issued2016
dc.date.submitted2016
dc.identifier.issn0151-9107
dc.identifier.urihttp://hdl.handle.net/10985/10959
dc.description.abstractMicrostructure, wear and friction coefficient of cr-based magnetron sputtered layers. CrN films were deposited on stainless steel and silicon substrates via magnetron reactive sputtering under a systematic variation of the substrate bias voltage. The influence of the substrate bias voltage on the structural and tribological properties of the films was investigated. The results indicated that increasing the negative bias voltage have many influence on the characteristic of the coatings: concerning their microstructure, we observed that the grain size increased, while their coefficient of friction is influenced by the bias voltage like the wear rate.
dc.language.isoen
dc.publisherLavoisier
dc.rightsPost-print
dc.subjectTribology
dc.subjectCrN
dc.subjectPVD
dc.titleEffect of substrate bias voltage on the microstructure and tribological properties of CrN coatings
dc.identifier.doi10.3166/acsm.40.9-15
dc.typdocArticle dans une revue avec comité de lecture
dc.localisationCentre de Cluny
dc.subject.halPhysique: matière Condensée: Science des matériaux
dc.subject.halSciences de l'ingénieur: Matériaux
dc.subject.halSciences de l'ingénieur: Mécanique
dc.subject.halSciences de l'ingénieur: Micro et nanotechnologies/Microélectronique
ensam.audienceInternationale
ensam.page9-15
ensam.journalAnnales de Chimie - Science des Matériaux
ensam.volume40
ensam.issue1-2
ensam.peerReviewingOui
hal.identifierhal-01666604
hal.version1
hal.statusaccept
dc.identifier.eissn1958-5934


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