Metal-to-Dielectric transition induced by annealing of oriented titanium thin films
dc.contributor.author
hal.structure.identifier | BESNARD, Aurélien
|
dc.contributor.author
hal.structure.identifier | MARTIN, Nicolas
|
dc.contributor.author
hal.structure.identifier | STAHL, Nicolas
|
dc.contributor.author
hal.structure.identifier | CARPENTIER, Luc
|
dc.contributor.author
hal.structure.identifier | RAUCH, Jean-Yves
|
dc.date.accessioned | 2013 |
dc.date.available | 2013 |
dc.date.issued | 2013 |
dc.date.submitted | 2013 |
dc.identifier.issn | 1793-6047 |
dc.identifier.uri | http://hdl.handle.net/10985/7486 |
dc.description.abstract | Titanium thin films were deposited by DC magnetron sputtering. The glancing angle deposition (GLAD) method was implemented to prepare two series of titanium films: perpendicular and oriented columnar structures. The first series was obtained with a conventional incident angle α of the sputtered particles (α = 0°), whereas the second one used a grazing incident angle α = 85°. Afterwards, the films were annealed in air using six cycles of temperature ranging from 293 K to 773 K. DC electrical conductivity was measured during the annealing treatment. Films deposited by conventional sputtering (α = 0°) kept a typical metallic-like behavior versus temperature (σ300 K = 2.0 × 10^6 S m-1 and TCR293 K = 1.52 × 10^-3 K-1), whereas those sputtered with α = 85° showed a gradual transition from metal to dielectric. Such a transition was mainly attributed to the high porous structure, which favors the oxidation of titanium films to tend to the TiO2 compound. |
dc.language.iso | en_US |
dc.publisher | World Scientific |
dc.rights | Pre-print |
dc.subject | sputtering |
dc.subject | thin films |
dc.subject | electrical properties |
dc.subject | metal |
dc.subject | dielectric |
dc.title | Metal-to-Dielectric transition induced by annealing of oriented titanium thin films |
dc.typdoc | Article dans une revue avec comité de lecture |
dc.localisation | Centre de Cluny |
dc.subject.hal | Physique: matière Condensée: Science des matériaux |
dc.subject.hal | Sciences de l'ingénieur: Energie électrique |
dc.subject.hal | Sciences de l'ingénieur: Matériaux |
dc.subject.hal | Sciences de l'ingénieur: Micro et nanotechnologies/Microélectronique |
ensam.audience | Non spécifiée |
ensam.page | 5 |
ensam.journal | Functional Materials Letters |
ensam.volume | 6 |
ensam.issue | 1 |
hal.identifier | hal-00903693 |
hal.version | 1 |
hal.status | accept |