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Investigation of vanadium and nitride alloys thin layers deposited by PVD

dc.contributor.authorBRAYEK, A.
dc.contributor.authorTLILI, Brahim
dc.contributor.authorGHRIB, Taher
dc.contributor.author
 hal.structure.identifier		NOUVEAU, Corinne
127742 Laboratoire Bourguignon des Matériaux et Procédés [LABOMAP]
dc.date.accessioned2013
dc.date.available2013
dc.date.issued2012
dc.date.submitted2013
dc.identifier.urihttp://hdl.handle.net/10985/7535
dc.descriptionLien vers la version éditeur: http://dx.doi.org/10.1051/epjconf/20122900042
dc.description.abstractIn this work we present the technique of magnetron vapor deposition and the effect of several deposition parameters on the structural and morphological properties of prepared thin films. It was noted that the deposition time has an effect on the crystallinity, mechanical properties such as residual stress, roughness surface and the layer composition from target products. Studies were carried out on layers of vanadium (V) and the nitride vanadium (VN).
dc.language.isoen
dc.publisherEDP Sciences
dc.rightsPost-print
dc.subjectPVD
dc.subjectVN
dc.subjectelectrical resistivity
dc.subjectroughness
dc.subjectresidual stress
dc.titleInvestigation of vanadium and nitride alloys thin layers deposited by PVD
dc.identifier.doi10.1051/epjconf/20122900042
dc.typdocCommunication avec acte
dc.localisationCentre de Cluny
dc.subject.halPhysique: matière Condensée: Science des matériaux
ensam.audienceInternationale
ensam.conference.titleEMM-FM2011 – First Euro Mediterranean Meeting on Functionalized Materials
ensam.conference.date2011-10
ensam.countryTunisia
ensam.title.proceedingEPJ Web of Conferences
ensam.page11p
ensam.volume29
ensam.issue00042
hal.identifierhal-00908940
hal.version1
hal.statusaccept


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