Sputtered tungsten-based ternary and quaternary layers for nanocrystalline diamond deposition
dc.contributor.author
hal.structure.identifier | WALOCK, Michael J.
|
dc.contributor.author | RAHIL, Issam |
dc.contributor.author
hal.structure.identifier | ZOU, Yujiao
|
dc.contributor.author | IMHOFF, Luc |
dc.contributor.author
hal.structure.identifier | CATLEDGE, Shane Aaron
|
dc.contributor.author
hal.structure.identifier | STANISHEVSKY, Andrei
|
dc.contributor.author
hal.structure.identifier | NOUVEAU, Corinne
|
dc.date.accessioned | 2014 |
dc.date.available | 2016 |
dc.date.issued | 2012 |
dc.date.submitted | 2013 |
dc.identifier.issn | 1533-4880 |
dc.identifier.uri | http://hdl.handle.net/10985/7992 |
dc.description.abstract | Many of today’s demanding applications require thin-film coatings with high hardness, toughness, and thermal stability. In many cases, coating thickness in the range 2–20 m and low surface roughness are required. Diamond films meet many of the stated requirements, but their crystalline nature leads to a high surface roughness. Nanocrystalline diamond offers a smoother surface, but significant surface modification of the substrate is necessary for successful nanocrystalline diamond deposition and adhesion. A hybrid hard and tough material may be required for either the desired applications, or as a basis for nanocrystalline diamond film growth. One possibility is a composite system based on carbides or nitrides. Many binary carbides and nitrides offer one or more mentioned properties. By combining these binary compounds in a ternary or quaternary nanocrystalline system, we can tailor the material for a desired combination of properties. Here, we describe the results on the structural and mechanical properties of the coating systems composed of tungsten chromium-carbide and/or nitride. These WC-Cr-(N) coatings are deposited using magnetron sputtering. The growth of adherent nanocrystalline diamond films by microwave plasma chemical vapor deposition has been demonstrated on these coatings. The WC-Cr-(N) and WC-Cr-(N)-NCD coatings are characterized with atomic force microscopy and SEM, X-ray diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy, and nanoindentation. |
dc.description.sponsorship | US National Science Foundation grants (DMR-08606521 and DMR-0922910) and the Regional Council of Burgundy, France |
dc.language.iso | en_US |
dc.publisher | American Scientific Publishers |
dc.rights | Post-print |
dc.subject | PVD WCCrN underlayers |
dc.subject | nc-D coatings by MWCVD |
dc.subject | improvement of diamond adhesion |
dc.title | Sputtered tungsten-based ternary and quaternary layers for nanocrystalline diamond deposition |
ensam.embargo.terms | 2 Years |
dc.identifier.doi | 10.1166/jnn.2012.4935 |
dc.typdoc | Article dans une revue avec comité de lecture |
dc.localisation | Centre de Cluny |
dc.subject.hal | Physique: matière Condensée: Science des matériaux |
dc.subject.hal | Sciences de l'ingénieur: Matériaux |
dc.subject.hal | Sciences de l'ingénieur: Plasmas |
ensam.audience | Internationale |
ensam.page | 4825-4831 |
ensam.journal | Journal of Nanoscience and Nanotechnology |
ensam.volume | 12 |
ensam.issue | 6 |
hal.status | unsent |