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<title>SAM</title>
<link>https://sam.ensam.eu:443</link>
<description>The DSpace digital repository system captures, stores, indexes, preserves, and distributes digital research material.</description>
<pubDate xmlns="http://apache.org/cocoon/i18n/2.1">Wed, 13 May 2026 15:42:58 GMT</pubDate>
<dc:date>2026-05-13T15:42:58Z</dc:date>
<item>
<title>Residual stress, mechanical and microstructure properties of multilayer Mo2N/CrN coating produced by R.F Magnetron discharge</title>
<link>http://hdl.handle.net/10985/11455</link>
<description>Residual stress, mechanical and microstructure properties of multilayer Mo2N/CrN coating produced by R.F Magnetron discharge
BOUAOUINA, Boudjemaa; BESNARD, Aurélien; ABAIDIA, Seddik El Hak; HAID, F.
We have investigated the effect of the period thickness of the multilayer Mo2N/CrN deposited on Si substrate produced by reactive magnetron sputtering. Mo2N presents a face centered cubic structure and CrN an orthorhombic one. The residual stress of the coatings was determined by the measurement of the substrate curvature. The microstructure of the multilayer was investigated from the X-ray diffraction and scanning electron microscopy (cross section images). The residual stresses resulting from the deposition of the different bi-layer thickness were measured and correlated to the structural properties of the coating as well as the nanoindentation analysis of the coating. The stresses are compressive and tensile for the individual Mo2N and CrN layer respectively. The result shows that an increase of the multilayer coatings Mo2N/CrN thicknesses induce an increase of the hardness and the elastic modulus, in the other hand the tensile stress increases. The shift of the XRD diffraction peak (1 1 1) of Mo2N at high angle which means the reduction of the residual stress is in good agreement with the residual stresses measurements.
</description>
<pubDate>Sun, 01 Jan 2017 00:00:00 GMT</pubDate>
<guid isPermaLink="false">http://hdl.handle.net/10985/11455</guid>
<dc:date>2017-01-01T00:00:00Z</dc:date>
<dc:creator>BOUAOUINA, Boudjemaa</dc:creator>
<dc:creator>BESNARD, Aurélien</dc:creator>
<dc:creator>ABAIDIA, Seddik El Hak</dc:creator>
<dc:creator>HAID, F.</dc:creator>
<dc:description>We have investigated the effect of the period thickness of the multilayer Mo2N/CrN deposited on Si substrate produced by reactive magnetron sputtering. Mo2N presents a face centered cubic structure and CrN an orthorhombic one. The residual stress of the coatings was determined by the measurement of the substrate curvature. The microstructure of the multilayer was investigated from the X-ray diffraction and scanning electron microscopy (cross section images). The residual stresses resulting from the deposition of the different bi-layer thickness were measured and correlated to the structural properties of the coating as well as the nanoindentation analysis of the coating. The stresses are compressive and tensile for the individual Mo2N and CrN layer respectively. The result shows that an increase of the multilayer coatings Mo2N/CrN thicknesses induce an increase of the hardness and the elastic modulus, in the other hand the tensile stress increases. The shift of the XRD diffraction peak (1 1 1) of Mo2N at high angle which means the reduction of the residual stress is in good agreement with the residual stresses measurements.</dc:description>
</item>
<item>
<title>Nanocolumnar TiN thin film growth by oblique angle sputter-deposition: Experiments vs. simulations</title>
<link>http://hdl.handle.net/10985/14017</link>
<description>Nanocolumnar TiN thin film growth by oblique angle sputter-deposition: Experiments vs. simulations
BOUAOUINA, Boudjemaa; MASTAIL, Cédric; BESNARD, Aurélien; MAREUS, Rubenson; NITA, Florin; MICHEL, Anny; ABADIAS, Grégory
Nanostructured columnar titanium nitride (TiN) thin films were produced by oblique angle deposition using reactive magnetron sputtering. The influence of the angular distribution of the incoming particle flux on the resulting filmmorphology (columntilt angle, porosity, surface roughness) was studied by varying the inclination angle α of the substrate at two different working pressures, 0.3 and 0.5 Pa. The microstructural features and columns tilt angles βexp determined experimentally were compared to those simulated from two kinetic Monte Carlo (KMC) models. With increasing pressure, the TiN columns were found to be less defined but no significant changes in βexp were revealed. Both KMC models satisfactorily reproduced the experimental findings, the agreement being closer at 0.5 Pa. The evolution of β angle is also discussed with respect to the resulting incidence angle θres of the incoming flux, this latter quantity accounting for the local incidence angle of individual particles,which may greatly differ fromthe geometrical angle α, especially at highworking pressure due to the incoming particle – gas collisions. Crossover phenomena between the 0.3 and 0.5 Pa series were revealed from the evolution of the film resistivity, as well as simulated layer density and surface roughness versus α angle.
</description>
<pubDate>Mon, 01 Jan 2018 00:00:00 GMT</pubDate>
<guid isPermaLink="false">http://hdl.handle.net/10985/14017</guid>
<dc:date>2018-01-01T00:00:00Z</dc:date>
<dc:creator>BOUAOUINA, Boudjemaa</dc:creator>
<dc:creator>MASTAIL, Cédric</dc:creator>
<dc:creator>BESNARD, Aurélien</dc:creator>
<dc:creator>MAREUS, Rubenson</dc:creator>
<dc:creator>NITA, Florin</dc:creator>
<dc:creator>MICHEL, Anny</dc:creator>
<dc:creator>ABADIAS, Grégory</dc:creator>
<dc:description>Nanostructured columnar titanium nitride (TiN) thin films were produced by oblique angle deposition using reactive magnetron sputtering. The influence of the angular distribution of the incoming particle flux on the resulting filmmorphology (columntilt angle, porosity, surface roughness) was studied by varying the inclination angle α of the substrate at two different working pressures, 0.3 and 0.5 Pa. The microstructural features and columns tilt angles βexp determined experimentally were compared to those simulated from two kinetic Monte Carlo (KMC) models. With increasing pressure, the TiN columns were found to be less defined but no significant changes in βexp were revealed. Both KMC models satisfactorily reproduced the experimental findings, the agreement being closer at 0.5 Pa. The evolution of β angle is also discussed with respect to the resulting incidence angle θres of the incoming flux, this latter quantity accounting for the local incidence angle of individual particles,which may greatly differ fromthe geometrical angle α, especially at highworking pressure due to the incoming particle – gas collisions. Crossover phenomena between the 0.3 and 0.5 Pa series were revealed from the evolution of the film resistivity, as well as simulated layer density and surface roughness versus α angle.</dc:description>
</item>
<item>
<title>Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive RF magnetron discharge</title>
<link>http://hdl.handle.net/10985/12774</link>
<description>Correlation between mechanical and microstructural properties of molybdenum nitride thin films deposited on silicon by reactive RF magnetron discharge
BOUAOUINA, Boudjemaa; BESNARD, Aurélien; ABAIDIA, Seddik El Hak; AIROUDJ, Aissam; BENSOUICI, Fayçal
Molybdenum nitride thin films were deposited on (100) silicon substrates by R.F. magnetron sputtering of a Mo target in a (Ar-N2) gas mixtures. The films were studied by Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS) and X-ray diffraction. The nanomechanical properties have been determined by nanoindentation and Peak-Force Quantitative Nanomechanical Mapping (PF-QNM). The total internal stresses were determined by curvature measurements and the Stoney formula. As thin film composition influences the morphology, the stress state and the mechanical properties, modifications are expected in this study where the nitrogen content is tuned. The film exhibits a polycrystalline structure with preferred orientation along (111) plane. The increase of the nitrogen content in the coating (N/Mo =1.1) induces a broadening of the full width at half maximum (FWHM) of the (111) diffraction peak, which is attributed to the presence of smaller crystallites. The residual stress and mechanical properties variation were correlated to the structural transition from γ-Mo2N to hexagonal and cubic MoN. The results show a good agreement between the nanomechanical properties obtained by nanoindentation and PF-QNM.
</description>
<pubDate>Mon, 01 Jan 2018 00:00:00 GMT</pubDate>
<guid isPermaLink="false">http://hdl.handle.net/10985/12774</guid>
<dc:date>2018-01-01T00:00:00Z</dc:date>
<dc:creator>BOUAOUINA, Boudjemaa</dc:creator>
<dc:creator>BESNARD, Aurélien</dc:creator>
<dc:creator>ABAIDIA, Seddik El Hak</dc:creator>
<dc:creator>AIROUDJ, Aissam</dc:creator>
<dc:creator>BENSOUICI, Fayçal</dc:creator>
<dc:description>Molybdenum nitride thin films were deposited on (100) silicon substrates by R.F. magnetron sputtering of a Mo target in a (Ar-N2) gas mixtures. The films were studied by Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS) and X-ray diffraction. The nanomechanical properties have been determined by nanoindentation and Peak-Force Quantitative Nanomechanical Mapping (PF-QNM). The total internal stresses were determined by curvature measurements and the Stoney formula. As thin film composition influences the morphology, the stress state and the mechanical properties, modifications are expected in this study where the nitrogen content is tuned. The film exhibits a polycrystalline structure with preferred orientation along (111) plane. The increase of the nitrogen content in the coating (N/Mo =1.1) induces a broadening of the full width at half maximum (FWHM) of the (111) diffraction peak, which is attributed to the presence of smaller crystallites. The residual stress and mechanical properties variation were correlated to the structural transition from γ-Mo2N to hexagonal and cubic MoN. The results show a good agreement between the nanomechanical properties obtained by nanoindentation and PF-QNM.</dc:description>
</item>
<item>
<title>Physico-Chemical and Mechanical Properties of DC-Sputtered ZrO2 Coatings Prepared by Oblique Angle Deposition</title>
<link>http://hdl.handle.net/10985/27106</link>
<description>Physico-Chemical and Mechanical Properties of DC-Sputtered ZrO2 Coatings Prepared by Oblique Angle Deposition
GZAIEL, Asma; AOUADI, Khalil; BESNARD, Aurélien; NOUVEAU, Corinne; PINOT, Yoann; BOUCHOUCHA, Faker; BOUAOUINA, Boudjemaa
In this study, a ZrO2 thin film was deposited onto a Ti6Al4V substrate using the Oblique Angle Deposition (OAD) technique. The influence of the substrate/Zr target an-gle (15°, 30°, 45°, and 60°) was investigated, with a fixed azimuthal orientation (Phi) of 180°. The primary objective of this work is to develop and characterize novel biocompatible coat-ings for hip prosthesis implants with a complex 3D spherical geometry. The OAD method enables thin film deposition on such geometries and enhances understanding of how the par-ticle incidence angle affects the surface morphology and microstructure of zirconium oxide (ZrO2) thin films. This study combines an experimental approach DC magnetron sputtering with a multi-scale numerical approach using Monte Carlo codes (SRIM, SIMTRA, and NASCAM). The structure, texture, and growth of the ZrO2 coatings were analyzed via X-ray diffraction (XRD), while microstructure and surface morphology were examined using scan-ning electron microscopy (SEM). Hardness and Young’s modulus were determined through nanoindentation testing. Results indicate that increasing the oblique angle leads to a decrease in hardness. Experimental and numerical findings complement each other, offering deeper insight into the deposition phenomena. SIMTRA simulations closely replicate experimental observations: a higher number of incident particles results in increased coating thickness. Additionally, the film thickness decreases with increasing substrate inclination angle. The microstructure of ZrO₂ thin films is strongly influenced by substrate orientation, and coated substrates demonstrate superior performance compared to their uncoated counterparts.
</description>
<pubDate>Sat, 25 Oct 2025 00:00:00 GMT</pubDate>
<guid isPermaLink="false">http://hdl.handle.net/10985/27106</guid>
<dc:date>2025-10-25T00:00:00Z</dc:date>
<dc:creator>GZAIEL, Asma</dc:creator>
<dc:creator>AOUADI, Khalil</dc:creator>
<dc:creator>BESNARD, Aurélien</dc:creator>
<dc:creator>NOUVEAU, Corinne</dc:creator>
<dc:creator>PINOT, Yoann</dc:creator>
<dc:creator>BOUCHOUCHA, Faker</dc:creator>
<dc:creator>BOUAOUINA, Boudjemaa</dc:creator>
<dc:description>In this study, a ZrO2 thin film was deposited onto a Ti6Al4V substrate using the Oblique Angle Deposition (OAD) technique. The influence of the substrate/Zr target an-gle (15°, 30°, 45°, and 60°) was investigated, with a fixed azimuthal orientation (Phi) of 180°. The primary objective of this work is to develop and characterize novel biocompatible coat-ings for hip prosthesis implants with a complex 3D spherical geometry. The OAD method enables thin film deposition on such geometries and enhances understanding of how the par-ticle incidence angle affects the surface morphology and microstructure of zirconium oxide (ZrO2) thin films. This study combines an experimental approach DC magnetron sputtering with a multi-scale numerical approach using Monte Carlo codes (SRIM, SIMTRA, and NASCAM). The structure, texture, and growth of the ZrO2 coatings were analyzed via X-ray diffraction (XRD), while microstructure and surface morphology were examined using scan-ning electron microscopy (SEM). Hardness and Young’s modulus were determined through nanoindentation testing. Results indicate that increasing the oblique angle leads to a decrease in hardness. Experimental and numerical findings complement each other, offering deeper insight into the deposition phenomena. SIMTRA simulations closely replicate experimental observations: a higher number of incident particles results in increased coating thickness. Additionally, the film thickness decreases with increasing substrate inclination angle. The microstructure of ZrO₂ thin films is strongly influenced by substrate orientation, and coated substrates demonstrate superior performance compared to their uncoated counterparts.</dc:description>
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