Thermal study of an aluminium nitride ceramic heater for spray CVD on glass substrates by quantitative thermography
Article dans une revue avec comité de lecture
Auteur
RIOU, Olivier
25533 Centre d'Etudes et Recherches en Thermique, Environnement et Systèmes [Créteil] [CERTES EA 3481]
25533 Centre d'Etudes et Recherches en Thermique, Environnement et Systèmes [Créteil] [CERTES EA 3481]
LOGERAIS, Pierre-Olivier
25533 Centre d'Etudes et Recherches en Thermique, Environnement et Systèmes [Créteil] [CERTES EA 3481]
25533 Centre d'Etudes et Recherches en Thermique, Environnement et Systèmes [Créteil] [CERTES EA 3481]
Date
2013Journal
Quantitative InfraRed Thermography JournalRésumé
A thermographic approach is used to determine the temperature of an aluminium nitride hot plate as a glass substrate heater for depositing thin films by spray CVD (Chemical Vapour Deposition). In this context, the temperature of the hot plate is conditioned by the evaluation of both effective emissivity and environment temperature with calibration curve of the commercial camera. We first examined the consistency of the thermosignal/temperature correspondence by employing the software calibration. The environment temperature is evaluated by means of a ruffled aluminium foil according to ASTM. The effective emissivity is measured in situ by using a commercial IR camera on the temperature range of [40°C, 540°C] with a better than 3% accuracy. Absolute value of effective emissivity is in agreement with spectrometric values up to 120°C. Above this temperature, a strong dependence with temperature is highlighted. The radiometric temperature values are thereby corrected with an exactitude of temperature better than 2.5% in Celsius degree for the highest temperatures considered.
Fichier(s) constituant cette publication
Cette publication figure dans le(s) laboratoire(s) suivant(s)
Documents liés
Visualiser des documents liés par titre, auteur, créateur et sujet.
-
Article dans une revue avec comité de lectureLOGERAIS, Pierre-Olivier; RIOU, Olivier; DELALEUX, Fabien; DURASTANTI, Jean-Félix; BOUTEVILLE, Anne (Elsevier, 2015)Rapid thermal processes are used in various key stages in the microelectronics industry. In this study, the heat transfer in a rapid thermal system is modelled with the finite volume method. The influence of the radiative ...
-
Article dans une revue avec comité de lectureLOGERAIS, Pierre-Olivier; KHELALFA, Raouf; RIOU, Olivier; DURASTANTI, Jean-Félix; BOUTEVILLE, Anne (Taylor & Francis, 2015)The heating of a silicon wafer in a rapid thermal process is studied by numerical simulation. In the model, the equations of conservation of mass and energy are solved with the finite volume method and the determination ...
-
Article dans une revue avec comité de lectureTOUIHRI, Saad; CATTIN, Linda; NGUYEN, Duc-Tuong; MORSLI, Mustapha; LOUARN, Guy; BOUTEVILLE, Anne; FROGER, Vincent; BERNÈDE, Jean-Christian (Elsevier, 2012)In2O3 thin films (100 nm thick) have been deposited by reactive evaporation of indium, in an oxygen partial atmosphere. Conductive (σ = 3.5×103 S/cm) and transparent films are obtained using the following experimental ...
-
Article dans une revue avec comité de lectureFROGER, Vincent; DABOS-SEIGNON, Sylvie; NOËL, Sophie; CHAPRON, David; BOUTEVILLE, Anne (2014)In this work, magnesium doped zinc oxide (Zn1-xMgxO) thin films were deposited using an original infrared assisted Spray Chemical Vapor Deposition (Spray-CVD) technique on borosilicate glass substrates. With a simple, safe ...
-
Communication avec actePETIT, Johann; BORNERT, Michel; HOFMANN, Felix A.; ROBACH, Odile; MICHA, Jean Sébastien; ULRICH, Olivier; LE BOURLOT, Christophe; FAURIE, Damien; KORSUNSKY, Alexander; CASTELNAU, Olivier (Elsevier, 2012)The X-ray Laue microdiffraction technique, available at beamline BM32 on the synchrotron ESRF, is ideally suited for probing the field of elastic strain (and associated stress) in deformed polycrystalline materials with a ...