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Ellipticity loss analysis for tangent moduli deduced from a large strain elastic–plastic self-consistent model

Article dans une revue avec comité de lecture
Author
FRANZ, Gérald
39101 Laboratoire des technologies innovantes - UR UPJV 3899 [LTI]
LORRAIN, Jean-Paul
BEN ZINEB, Tarak
LEMOINE, Xavier
BERVEILLER, Marcel
ccABED-MERAIM, Farid 
1104 Laboratoire de physique et mécanique des matériaux [LPMM]
178323 Laboratoire d'Etude des Microstructures et de Mécanique des Matériaux [LEM3]

URI
http://www.sciencedirect.com/science/article/pii/S074964190800034X
http://hdl.handle.net/10985/8874
DOI
10.1016/j.ijplas.2008.02.006
Date
2009
Journal
International Journal of Plasticity

Abstract

In order to investigate the impact of microstructures and deformation mechanisms on the ductility of materials, the criterion first proposed by Rice is applied to elastic–plastic tangent moduli derived from a large strain micromechanical model combined with a self-consistent scale-transition technique. This approach takes into account several microstructural aspects for polycrystalline aggregates: initial and induced textures, dislocation densities as well as softening mechanisms such that the behavior during complex loading paths can be accurately described. In order to significantly reduce the computing time, a new method drawn from viscoplastic formulations is introduced so that the slip system activity can be efficiently determined. The different aspects of the single crystal hardening (self and latent hardening, dislocation storage and annihilation, mean free path, etc.) are taken into account both by the introduction of dislocation densities per slip system as internal variables and the corresponding evolution equations. Comparisons are made with experimental results for single and dual-phase steels involving linear and complex loading paths. Rice’s criterion is then coupled and applied to this constitutive model in order to determine the ellipticity loss of the polycrystalline tangent modulus. This criterion, which does not need any additional “fitting” parameter, is used to build Ellipticity Limit Diagrams (ELDs).

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