Critical angles in DC magnetron glad thin films
TypeArticles dans des revues avec comité de lecture
The objective of this study is to examine the sudden drop in properties of aluminum, titanium and chromium thin films prepared by the glancing angle deposition method. The thin films were deposited by DC magnetron sputtering under identical deposition conditions. A substrate-holder with seven different orientations with respect to the target normal was used. The thickness and the column tilt angles (β) of the thin films were determined by scanning electron microscopy. The residual stress of the thin films was evaluated using the wafer curvature technique and calculated by the Stoney's formula. The thickness variation and column tilt angle versus the orientation of the substrate indicated that the critical point is around 60° for all metallic materials and a critical angle of 60° is also found for the residual stress. Simulations of the particles transport are compared to the experimental data and moderate the critical angles analyses.
Showing items related by title, author, creator and subject.
SIAD, Ahcene; NOUVEAU, Corinne; BESNARD, Aurélien; JACQUET, Philippe; QUESADA, Jean (Lavoisier, 2015)The objective of this study is to determine the influence of duplex treatment (low pressure thermochemical treatment and PVD coating) on tribological properties. The carbide and carbonitride coatings are deposited by dual ...
Curvature radius measurement by optical profiler and determination of the residual stress in thin films BESNARD, Aurélien; ARDIGO, Maria-Rosa; IMHOFF, Luc; JACQUET, Philippe (Elsevier BV, 2019)The Stoney formula, based on the measurement of the substrate curvature, is often used for the determination of the thin films' residual stress. In this study, titanium nitride coatings were deposited by DC reactive magnetron ...
TLILI, Brahim; NOUVEAU, Corinne; GUILLEMOT, Gildas; BESNARD, Aurélien; BARKAOUI, Abdelwahed (Springer, 2018)The control of residual stresses has been seldom investigated in multilayer coatings dedicated to improvement of wear behavior. Here, we report the preparation and characterization of superposed structures composed of Cr, ...
Effect of substrate bias voltage on the microstructure and tribological properties of CrN coatings AOUADI, Khalil; NOUVEAU, Corinne; BESNARD, Aurélien; TLILI, Brahim; CHAFRA, Moez (Lavoisier, 2016)Microstructure, wear and friction coefficient of cr-based magnetron sputtered layers. CrN films were deposited on stainless steel and silicon substrates via magnetron reactive sputtering under a systematic variation of the ...
The contribution of grain boundary barriers to the electrical conductivity of titanium oxide thin films MARTIN, Nicolas; BESNARD, Aurélien; STAHL, Fabrice; VAZ, Filipe; NOUVEAU, Corinne (American Institute of Physics, 2008)Titanium oxide thin films were prepared by reactive magnetron sputtering. The reactive gas pulsing process was implemented to control the oxygen injection in the deposition process and,consequently, to tune the oxygen ...