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Characterisation of R.F. magnetron sputtered Cr-N, Cr-Zr-N and Zr-N coatings

Article dans une revue avec comité de lecture
Author
FELLAH, Mamoun
266547 Université Badji Mokhtar [Annaba] = Badji Mokhtar University [Annaba] = (عنابة) جامعة باجي مختار–عنابة [UBMA]
AISSANI, Linda
266547 Université Badji Mokhtar [Annaba] = Badji Mokhtar University [Annaba] = (عنابة) جامعة باجي مختار–عنابة [UBMA]
MECHACHETI, Said
266547 Université Badji Mokhtar [Annaba] = Badji Mokhtar University [Annaba] = (عنابة) جامعة باجي مختار–عنابة [UBMA]
TOUHAMI, Mohamed Zine
266547 Université Badji Mokhtar [Annaba] = Badji Mokhtar University [Annaba] = (عنابة) جامعة باجي مختار–عنابة [UBMA]
IOST, Alain
ABDUL SAMAD, Mohammed
ccMONTAGNE, Alex
211915 Mechanics surfaces and materials processing [MSMP]

URI
http://hdl.handle.net/10985/12001
DOI
10.1080/00794236.2017.1339464
Date
2017
Journal
Transactions of the Institute of Metal Finishing

Abstract

Binary Cr-N, Zr-N and Cr-Zr-N films were synthesised using a R.F. reactive magnetron sputtering technique by co-sputtering Cr and Zr. The crystalline structure, morphology, mechanical and tribological properties of the films as a function of Zr content were characterised by X-ray diffraction, microanalysis X (WDS, EDS), X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, nanoindentation, scratch adhesion and pin-on-disc sliding wear tests. The residual stress was calculated with the Stoney formula. The Cr-Zr-N films exhibit a two-phase microstructure, containing a cubic (CrN, ZrN) with hexagonal (Cr2N, Zr2N) phases, as shown by X-ray diffraction. As the Zr content increased, a columnar and compact structure is developed with a low surface roughness. The results reveal that the mechanical and tribological properties of the films were found to depend on the Zr content and the hardness (maximum 26.3 GPa) is greatly improved in comparison with CrN and ZrN films, especially at 31 at.-% Zr. In the scratch test, the hardest film (Cr0.18Zr0.31N0.47) exhibited an adhesive failure at Lc2 = 34.3 N.

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