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Study of the influence of the pressure and rotational motion of 3D substrates processed by magnetron sputtering: A comparative study between Monte Carlo modelling and experiments

Type
Articles dans des revues avec comité de lecture
Auteur
EVRARD, Martin
104540 Centre de Recherche en Physique de la Matière et du Rayonnement [Namur] [PMR]
BESNARD, Aurélien
127742 Laboratoire Bourguignon des Matériaux et Procédés [LABOMAP]
LUCAS, Stephane
104540 Centre de Recherche en Physique de la Matière et du Rayonnement [Namur] [PMR]

URI
http://hdl.handle.net/10985/17657
DOI
10.1016/j.surfcoat.2019.125070
Date
2019
Journal
Surface and Coatings Technology

Résumé

Over the last ten years, low pressure plasma solutions for materials surface treatment have been remarkable. Nevertheless, the deposition of films with a uniform thickness on 3D complex shapes is still a challenge for various deposition systems. In several cases, concavities and different substrate orientations and motions lead to macroscopic shadowing and affect the thickness uniformity. The objective of this work is to describe a modelling method able to predict the layer thickness on any surface of 3D substrates in motion and subject to vapour transported in a low pressure vessel. The meshing of objects with Delaunay-triangulation enables the modelling of complex shapes. The deposition process consists of several Monte Carlo simulations involving first the computing of the angular and energy particles distribution from the source, second their transport through the chamber and last the deposition on a meshed substrate. The algorithm is optimised with a “cell-list-linked-like” method and differs from existing models by the computation speed. The benchmarking between simulation and experimental results for Cr, Ag and Ta deposition at various pressures and on moving complex substrates with several shadowed faces is presented. Moreover, particle energy distribution will be discussed for each sample surface, mode and pressure.

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Nom:
LABOMAP_SCT_2019_BESNARD.pdf
Taille:
2.145Mo
Format:
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Fin d'embargo:
2020-05-25
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    An original reactive sputtering method, namely the reactive gas pulsing process (RGPP) was developed for the synthesis of titanium oxynitride thin films. Such a method implements a metallic titanium target DC sputtered, a ...

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