Stoney formula: Investigation of curvature measurements by optical profilometer
TypeArticles dans des revues avec comité de lecture
Thin films’ residual stress is often determined by the Stoney formula, using the measurements of the substrate curvature, even if the required hypotheses are not completely respected. In this study, a 2.2 μm titanium nitride coating was deposited by reactive sputtering on a silicon substrate. The Stoney formula was used in order to calculate the residual stress of the film. The radius of curvature was measured, before and after coating by optical profilometer, considering the whole surface of the sample. The effect of the substrate shape (square and rectangular) with various dimensions was investigated. We showed that the shape of the substrate influence strongly the deformation. Moreover, it was highlighted that the choice of the radius (maximum value, minimum value, mean value, with or without initial curvature correction) is critical to the determination of the stress.
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Curvature radius measurement by optical profiler and determination of the residual stress in thin films BESNARD, Aurélien; ARDIGO, Maria-Rosa; IMHOFF, Luc; JACQUET, Philippe (Elsevier BV, 2019)The Stoney formula, based on the measurement of the substrate curvature, is often used for the determination of the thin films' residual stress. In this study, titanium nitride coatings were deposited by DC reactive magnetron ...
ZAIRI, Amel; NOUVEAU, Corinne; LARBI, Ahmed Beb Cheikh; IOST, Alain; MARTIN, Nicolas; BESNARD, Aurélien (Maney Publishing, 2014)CrSiN films were deposited by reactive radio frequency magnetron sputtering in an Ar+N2 gas mixture. The nitrogen gas was injected in the deposition chamber using two methods: the classical constant injection and pulsed ...
BESNARD, Aurélien; MARTIN, Nicolas; STAHL, Nicolas; CARPENTIER, Luc; RAUCH, Jean-Yves (World Scientific Publishing, 2013)Titanium thin films were deposited by DC magnetron sputtering. The glancing angle deposition (GLAD) method was implemented to prepare two series of titanium films: perpendicular and oriented columnar structures. The first ...
Nanocolumnar TiN thin film growth by oblique angle sputter-deposition: Experiments vs. simulations BOUAOUINA, Boudjemaa; MASTAIL, Cédric; BESNARD, Aurélien; MAREUS, Rubenson; NITA, Florin; MICHEL, Anny; ABADIAS, Grégory (Elsevier, 2018)Nanostructured columnar titanium nitride (TiN) thin films were produced by oblique angle deposition using reactive magnetron sputtering. The influence of the angular distribution of the incoming particle flux on the resulting ...
TLILI, Brahim; NOUVEAU, Corinne; GUILLEMOT, Gildas; BESNARD, Aurélien; BARKAOUI, Abdelwahed (Springer, 2018)The control of residual stresses has been seldom investigated in multilayer coatings dedicated to improvement of wear behavior. Here, we report the preparation and characterization of superposed structures composed of Cr, ...