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Imperfection-sensitive ductility of aluminium thin films

Article dans une revue avec comité de lecture
Author
COULOMBIER, Marc
169760 Institute of Mechanics, Materials and Civil Engineering [Louvain] [IMMC]
BOE, Alexandre
1296 Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
244724 Institut de Recherche sur les Composants logiciels et matériels pour l'Information et la Communication Avancée - UAR 3380 [IRCICA]
RASKIN, Jean.Pierre
7935 Dispositifs Intégrés et Circuits Electroniques Machine Learning Group [DICE - MLG]
99828 Département de mathématique [Louvain]
197411 Institute of Information and Communication Technologies, Electronics and Applied Mathematics [ICTEAM]
PARDOEN, Therry
99828 Département de mathématique [Louvain]
169760 Institute of Mechanics, Materials and Civil Engineering [Louvain] [IMMC]
ccBRUGGER, Charles
32956 Science et Ingénierie des Matériaux et Procédés [SIMaP]

URI
http://hdl.handle.net/10985/14836
DOI
10.1016
Date
2010
Journal
Acta Materialia

Abstract

Ductility, defined as the strain at the onset of necking, has been characterized in thin Al films using an on-chip, internal stress actuated, microtensile testing setup. In the smallest specimens, the ductility is equal to 0.08 and 0.27 for 200 and 375 nm thick films, respectively, while the average strain-hardening exponents are, respectively, equal to 0.11 and 0.23. In addition to the thickness effect, ductility decreases with increasing specimen size due to imperfection sensitivity, involving a size-dependent statistical behaviour.

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