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Thermal study of an aluminium nitride ceramic heater for spray CVD on glass substrates by quantitative thermography

Article dans une revue avec comité de lecture
Auteur
RIOU, Olivier
25533 Centre d'Etudes et Recherches en Thermique, Environnement et Systèmes [Créteil] [CERTES EA 3481]
LOGERAIS, Pierre-Olivier
25533 Centre d'Etudes et Recherches en Thermique, Environnement et Systèmes [Créteil] [CERTES EA 3481]
FROGER, Vincent
211916 Laboratoire Angevin de Mécanique, Procédés et InnovAtion [LAMPA]
DURASTANTI, Jean-Félix
25533 Centre d'Etudes et Recherches en Thermique, Environnement et Systèmes [Créteil] [CERTES EA 3481]
BOUTEVILLE, Anne
211916 Laboratoire Angevin de Mécanique, Procédés et InnovAtion [LAMPA]

URI
http://hdl.handle.net/10985/10286
DOI
10.1080/17686733.2013.793468
Date
2013
Journal
Quantitative InfraRed Thermography Journal

Résumé

A thermographic approach is used to determine the temperature of an aluminium nitride hot plate as a glass substrate heater for depositing thin films by spray CVD (Chemical Vapour Deposition). In this context, the temperature of the hot plate is conditioned by the evaluation of both effective emissivity and environment temperature with calibration curve of the commercial camera. We first examined the consistency of the thermosignal/temperature correspondence by employing the software calibration. The environment temperature is evaluated by means of a ruffled aluminium foil according to ASTM. The effective emissivity is measured in situ by using a commercial IR camera on the temperature range of [40°C, 540°C] with a better than 3% accuracy. Absolute value of effective emissivity is in agreement with spectrometric values up to 120°C. Above this temperature, a strong dependence with temperature is highlighted. The radiometric temperature values are thereby corrected with an exactitude of temperature better than 2.5% in Celsius degree for the highest temperatures considered.

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  • Laboratoire Angevin de Mécanique, Procédés et InnovAtion (LAMPA)

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