Growth, structural and electrical properties of polar ZnO thin films on MgO (100) substrates
Article dans une revue avec comité de lecture
Author
NISTOR, Magdalena G.
380269 National Institute for Lasers, Plasma, and Radiation Physics - INFLPR (ROMANIA)
380269 National Institute for Lasers, Plasma, and Radiation Physics - INFLPR (ROMANIA)
MANDACHE, Nicolae Bogdan
380269 National Institute for Lasers, Plasma, and Radiation Physics - INFLPR (ROMANIA)
380269 National Institute for Lasers, Plasma, and Radiation Physics - INFLPR (ROMANIA)
Date
2011Journal
Thin Solid FilmsAbstract
ZnO films have been grown on (100) oriented MgO substrates by pulsed-electron beam deposition in the room temperature to 500 °C range. Highly (00•2) textured films are obtained for a growth temperature higher than 200 °C, and epitaxial films are formed at 500 °C with the following epitaxial relationships: (1-1•0)ZnO // (110)MgO and (11•0)ZnO // (110)MgO, despite the difference in symmetry between film and substrate. The low temperature resistivity curves evidenced a metal-semiconductor transition for the ZnO films grown in the 300 to 500 °C range which has been interpreted in the frame of the model of conductivity in disordered oxides.
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